https://data.archives-ouvertes.fr/author/775138

https://data.archives-ouvertes.fr/author/775138

http://xmlns.com/foaf/0.1/familyName Lundin
http://xmlns.com/foaf/0.1/topic_interest Thin film
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/spi.plasma
http://xmlns.com/foaf/0.1/firstName Daniel
http://xmlns.com/foaf/0.1/topic_interest Residual stress
http://xmlns.com/foaf/0.1/topic_interest Intrinsic stress
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/sde.be
http://www.w3.org/1999/02/22-rdf-syntax-ns#type http://xmlns.com/foaf/0.1/Person
http://xmlns.com/foaf/0.1/name Daniel Lundin
http://xmlns.com/foaf/0.1/topic_interest Thin films
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/spi.gproc
http://xmlns.com/foaf/0.1/topic_interest High power impulse magnetron sputtering
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/sdv.bbm
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/phys.phys.phys-plasm-ph
http://xmlns.com/foaf/0.1/topic_interest Copper
http://www.w3.org/2002/07/owl#sameAs 232893020
http://xmlns.com/foaf/0.1/topic_interest Structural properties
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/sdv.mp.bac
http://xmlns.com/foaf/0.1/topic_interest Electronic devices
http://xmlns.com/foaf/0.1/topic_interest Titanium nitride
http://xmlns.com/foaf/0.1/topic_interest Nucleation and growth
http://xmlns.com/foaf/0.1/topic_interest Substrate bias synchronization
http://www.w3.org/2002/07/owl#sameAs 0000-0001-8591-1003
http://xmlns.com/foaf/0.1/topic_interest HiPIMS
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/chim.mate
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/sdv.bid
https://aurehal.archives-ouvertes.fr/author/775138

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