https://data.archives-ouvertes.fr/author/864373

https://data.archives-ouvertes.fr/author/864373

http://xmlns.com/foaf/0.1/topic_interest Polycrystalline silicon
http://xmlns.com/foaf/0.1/topic_interest Solid state reaction
http://xmlns.com/foaf/0.1/topic_interest Thin film
http://xmlns.com/foaf/0.1/topic_interest Seebeck coefficient
http://xmlns.com/foaf/0.1/topic_interest Simulation
http://xmlns.com/foaf/0.1/topic_interest III-IV semi-conductors
http://xmlns.com/foaf/0.1/topic_interest Surface and Interfaces
http://xmlns.com/foaf/0.1/topic_interest Oxidation
http://xmlns.com/foaf/0.1/mbox_sha1sum cf7fc8375e64d21e199b28a30a8b9153
http://xmlns.com/foaf/0.1/topic_interest SiGe
http://xmlns.com/foaf/0.1/topic_interest Thin films
http://xmlns.com/foaf/0.1/topic_interest Iron
http://xmlns.com/foaf/0.1/topic_interest MnCoGe
http://xmlns.com/foaf/0.1/familyName Portavoce
http://xmlns.com/foaf/0.1/topic_interest Intermetallic growth
http://xmlns.com/foaf/0.1/topic_interest Interface
http://xmlns.com/foaf/0.1/topic_interest Thin film dissolution
http://xmlns.com/foaf/0.1/topic_interest Si001
http://xmlns.com/foaf/0.1/topic_interest Anomalous diffusion kinetics
http://www.w3.org/1999/02/22-rdf-syntax-ns#type http://xmlns.com/foaf/0.1/Person
http://xmlns.com/foaf/0.1/topic_interest Biaxial stress
http://xmlns.com/foaf/0.1/topic_interest Amorphous Silicon
http://xmlns.com/foaf/0.1/topic_interest As
http://xmlns.com/foaf/0.1/topic_interest Reaction
http://xmlns.com/foaf/0.1/topic_interest Crystallization
http://xmlns.com/foaf/0.1/topic_interest Curie temperature
http://xmlns.com/foaf/0.1/topic_interest Computer simulations and experiments
http://xmlns.com/foaf/0.1/topic_interest Tungsten
http://www.w3.org/2002/07/owl#sameAs 0000-0002-6390-1637
http://xmlns.com/foaf/0.1/topic_interest Dopant interactions
http://xmlns.com/foaf/0.1/topic_interest Silicon
http://xmlns.com/foaf/0.1/topic_interest In situ X-ray diffraction
http://xmlns.com/foaf/0.1/topic_interest Phosphorus
http://xmlns.com/foaf/0.1/topic_interest Auger electron spectroscopy
http://xmlns.com/foaf/0.1/topic_interest LEED
http://xmlns.com/foaf/0.1/topic_interest SIMS
http://xmlns.com/foaf/0.1/topic_interest Reactive diffusion
http://xmlns.com/foaf/0.1/topic_interest XPS
http://xmlns.com/foaf/0.1/topic_interest Copper-silicides
http://xmlns.com/foaf/0.1/topic_interest Grain boundary diffusion
http://xmlns.com/foaf/0.1/topic_interest Boron
http://xmlns.com/foaf/0.1/topic_interest Solid-state reaction
http://xmlns.com/foaf/0.1/topic_interest MgAgSb
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/phys.cond.cm-ms
http://xmlns.com/foaf/0.1/topic_interest Diffusion
http://xmlns.com/foaf/0.1/topic_interest Silicon crystallization
http://xmlns.com/foaf/0.1/topic_interest Kinetics
http://xmlns.com/foaf/0.1/topic_interest Hwang-Balluffi method
http://xmlns.com/foaf/0.1/topic_interest Ni-thin films
http://xmlns.com/foaf/0.1/topic_interest Thickness
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/spi.tron
http://xmlns.com/foaf/0.1/topic_interest Ferromagnetic
http://xmlns.com/foaf/0.1/topic_interest Thermoelectricity
http://xmlns.com/foaf/0.1/topic_interest Spin caloritronics
http://xmlns.com/foaf/0.1/topic_interest Characterization methods
http://xmlns.com/foaf/0.1/firstName Alain
http://xmlns.com/foaf/0.1/topic_interest AES
http://xmlns.com/foaf/0.1/name Alain Portavoce
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/chim.mate
http://xmlns.com/foaf/0.1/topic_interest XRD
https://aurehal.archives-ouvertes.fr/author/864373

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